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    Tutorial Lecture

    Plasma Fundamentals

    Title of Tutorial Introduction to plasma discharges and their diagnostics
    Speaker Holger Kersten
    Affiliation Kiel University
    Description In the tutorial, the generation and spatial structure of steady state and self-sustaining non-thermal plasmas are discussed.
    Classification of discharge modes was initially based on their visual appearance and later by their current-voltage characteristics.
    Oscillating or pulsing of power supplied, involvement of magnetic fields, effects of electrode geometry etc. make the situation more complicated. Familiar terms such as glow, arc, spark, corona discharges have evolved and later further refinements such as “normal glow” vs “anomalous glow” and “thermionic arc” vs “cathodic arc” gave more structure to classifications and indicated growing insights into the various phenomena and conditions leading to specific discharges and their technological applications. Effects like secondary electron emission, thermionic emission, drifts in magnetic fields, gas heating and flow pattern etc. affect the discharge mechanism as well and may influence complex electrode erosion used in magnetron sputtering and HiPIMS.
    Since the industrial applications of gas discharges are numerous – e.g. thin film deposition and surface etching, modification of (nano)-materials, light sources and displays as well as waste treatment and even plasma medicine –, optimization of process plasmas by suitable diagnostics of the bulk as well as of the sheath in front of solid surfaces are necessary. Among them methods for the flux measurement of charged and neutral species toward plasma-facing surfaces by probes are of special interest.
    In addition to well-established conventional diagnostics as Langmuir probes (LPs), Faraday cups (FCs) and retarding field analyzers (RFA), also the principles of “non-conventional” diagnostics as calorimetric probes (CPs) and force probes (FPs) will be discussed. These rather simple methods are useful tools for the measurement of overall, not species resolved, ions and neutral particle fluxes toward surfaces. Of particular interest is the combination of different types of probes, e.g.
    Keywords gas discharges, probe diagnostics, energy and momentum flux, sputtering, HiPIMS
    Schedule 10:20 – 11:20, November 3 (Mon), 2025
    Venue Montha, Courtyard by Marriott Phuket Town (3F)



    Coatings and Thin Films

    Title of Tutorial Advanced Coating Technology and Application
    Speaker Jyh-Wei Lee
    Affiliation Ming Chi University of Technology (Taiwan)
    Description 1. Introduction: Overview of thin film deposition techniques, DC magnetron sputtering (MS), RF-MS, Mid-frequency-MS, Cathodic arc, HiPIMS
    2. Principles of HiPIMS and reactive HiPIMS (R-HiPIMS)
    3. Plasma and discharge Characteristics of HiPIMS and R-HiPIMS
    4. Process parameters and control of HiPIMS and R-HiPIMS
    5. Advantages of HiPIMS and R-HiPIMS
    6. Limitations and challenges of HiPIMS and R-HiPIMS
    7. Recent developments and applications of HiPIMS and R-HiPIMS technology
    Keywords HiPIMS and reactive HiPIMS technology
    Schedule 14:45 – 15:45, November 3 (Mon), 2025
    Venue Dok Pikul, Courtyard by Marriott Phuket Town (4F)

    Title of Tutorial Tailoring Thin Film Properties by Choice of Technology and Process Parameters
    Speaker Ralf Bandorf
    Affiliation Fraunhofer Institute for Surface Engineering and Thin Films IST (Germany)
    Description Vacuum coatings play a vital role in enhancing the performance, appearance, and functionality of the majority of daily goods, leading to improved consumer satisfaction and product effectiveness. Tailoring the properties of the used thin films is crucial for their performance and applicability in the use case. By adjusting deposition parameters such as substrate temperature, gas composition, power levels, and many more the microstructure, composition, and mechanical properties of coating can be tailored. Sometimes there are limitation for applying the desired modification, e.g. high temperature on thermally sensitive substrates. Therefore alternative routes for depositing or in general tailoring the energetics of the growth process are highly welcome. The course covers the introduction of growth mechanisms and interaction of energetic particles with the substrate or in general surfaces. We will introduce and discuss Structure Zone Models SZM. Using the SZM is a powerful tool for tailoring the coating properties. Finally, different approaches like the selection of deposition technique, energetic impact, thermal enhancement, … will be discussed. The goal of the course is to provide a practical approach for tailoring coating properties according to the substrates demands.
    Schedule 15:45 – 16:45, November 3 (Mon), 2025
    Venue Dok Pikul, Courtyard by Marriott Phuket Town (4F)
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    Plasma DX and AI

    Title of Tutorial Science-Based, Data-Driven Plasma Process Development
    Speaker Kenji Ishikawa
    Affiliation Nagoya University (Japan)
    Description This tutorial introduces a science-based, data-driven framework for understanding, modeling, and controlling such processes. Emphasis is placed on the hierarchical nature of plasma–surface interactions, including gas-phase chemistry, sheath dynamics, and surface reactions. This explains how physical modeling can be complemented by data-driven approaches, including machine learning, to enhance process predictability and robustness.
    Participants will learn how to extract meaningful features from process and sensor data, construct predictive models, and integrate them with physical insights. Topics include hybrid modeling, real-time optimization, and anomaly detection. This tutorial provides a foundation for applying data science techniques to plasma process development, with the goal of achieving higher precision, stability, and manufacturability.
    Keywords Plasma process control; Reactive ion etching; Machine learning; Atomic layer etching
    Schedule 13:00 – 14:00, November 5 (Wed), 2025
    Venue Dok Pikul, Courtyard by Marriott Phuket Town (4F)