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    KeyNote Speakers

    2-D MoS2 Atomic Layer Etching and It's Effect on Device Characteristics
    Geun Young YOM
    Sungkyunkwan Unversity, Korea
    INCA: A new scalable large area plasma source at low pressures
    Uwe Czarnetzki
    Ruhr-University Bochum, Germany
    Impacts of plasma process-induced damage on future devices
    Koji Eriguchi
    Kyoto University, Japan
    Great potential of the controlled reactive HiPIMS for a low-temperature deposition of functional oxides and tunable oxynitrides
    Jaroslav Vlček
    University. of West Bohemia, Czech Republic
    Atmospheric PECVD for thin film deposition
    Jerome Pulpytel
    Sorbonne University, France
    Super anticorrosion of aluminized steel by a cotrolled Mg supply
    Jae-In Jeong
    Research Institute of Industrial Science and Technology, Korea
    Digitization of Coatings for Mobility for tomorrow
    Nazlim Bagcivan
    Schaeffler AG, Herzogenaurach, Germany