Scientific Program

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    KeyNote Speakers

    2-D MoS2 Atomic Layer Etching and It's Effect on Device Characteristics
    Geun Young YOM
    Sungkyunkwan Unversity, Korea
    Profile
    Sputtering as key for innovations – some recent results from R+D
    Prof. Dr. Günter Bräuer
    Fraunhofer Institute for Surface Engineering and Thin Films IST, Germany
    Profile
    Impacts of plasma process-induced damage on future devices
    Koji Eriguchi
    Kyoto University, Japan
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    Great potential of the controlled reactive HiPIMS for a low-temperature deposition of functional oxides and tunable oxynitrides
    Jaroslav Vlček
    University. of West Bohemia, Czech Republic
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    Atmospheric PECVD for thin film deposition: Applications to material bonding and anticorrosion protection
    Jerome Pulpytel
    Sorbonne University, France
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    Super anticorrosion of aluminized steel by a cotrolled Mg supply
    Jae-In Jeong
    Research Institute of Industrial Science and Technology, Korea
    Profile