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    Invited Speakers

    Fundamental for Plasmas, Films and Coatings

    Name Affiliation Nationality Presentaion title
    Atsushi Ito National Institute for Fusion Science Japan
    Realistic timescale simulation for helium plasma induced tungsten nanostructure formation by multi-hybrid simulation
    Henri Mariette CNRS, Laboratoire de Spectrometrie hysique, Universite J France
    Surface Energy: A key parameter for epitaxial films growth and plasma actomic layer etching

    Functional Films and Processes for Semiconductor and electronics

    Name Affiliation Nationality Presentaion title
    Masaru Kurihara Hitachi, Ltd., Japan
    Single Reaction Control for Atomic Layer Etching
    Masakazu Minami Horiba Stec Japan
    Vapor delivery and process monitoring for semiconductor manufacturing process

    Tribological and Protective Coatings

    Name Affiliation Nationality Presentaion title
    Ryuta Ichiki Oita University Japan
    Non-Vacuum Plasma Nitriding with Pulsed-Arc Plasma and Barrier Discharge

    Optics and Optoelectronics

    Name Affiliation Nationality Presentaion title

    Nano materials and Devices

    Name Affiliation Nationality Presentaion title
    Toshiaki Kato Tohoku University Japan
    Graphene nanoribbon electronics fabricated with advanced plasma processing
    Silke Christiansen Helmholz Zentrum Berlin Germany
    3D nano architectures in energy- and bio- technologies

    Functional Plasma Coatings and Surface Treatment

    Name Affiliation Nationality Presentaion title
    Maik Fröhlich Leipnitz Institute for Plasma Science and Technology Germany
    Investigations on the effect of high voltage pulsed bias on coating deposition by HiPIMS
    Kerstin Thorwart EMPA Swiss
    Coatings for Med-Tech Application: Smarter Implants by HiPIMS
    Yuzo Shigesato Aoyama Gakuin University Japan
    Reactive sputtering to deposit various functional oxide films with precisely controlled stoichiometry
    Tomas Nyberg Angstrom University Swiss
    Sputtered high quality two dimensional metal sulphide films

    Green energy and Environment

    Name Affiliation Nationality Presentaion title
    Ji-Won Choi KAIST Korea
    Thin Film Rechargeable Batteries for Smart Glass/Lens
    Makoto Kambara University of Tokyo Japan
    Nanoparticle production using thermal plasma for Li+ battery in the next generation
    Tomohiro Nozaki Tokyo Institute of Technology Japan
    A source of synergism in plasma catalysis of methane dry reforming
    Tao Shao Chinese Academy of Sciences, Institute of Electrical Eng., China
    Pulsed discharge plasma assisted methane conversion: Direct conversion and dry reforming

    Bio, Medicine, Agriculture and Life Science

    Name Affiliation Nationality Presentaion title
    Kristian Wende INP Greifswald Germany
    Proteins and Lipids as Targets of Plasma Liquid Chemistry
    Toshiyuki Kawasaki Nishinippon Institute of Technology Japan
    Visualization and control of 2-D ROS distribution in liquid matter irradiated with an atmospheric-pressure plasma-jet
    Abhijit Majumdar IIEST India
    Plasma-jet applications for treatment of fungal infections
    Jong-Shinn Wu National Chiao Tung University Taiwan
    Investigation of Hemostasis Acceleration Using an Atmospheric-Pressure Plasma Jet

    Wet and Plasma Electrolytic Technology

    Name Affiliation Nationality Presentaion title
    Aleksey Yerokhin Manchester University UK
    Mechanism of Charge Transfer underlying Electrolytic Plasma Process
    Evgeny Parfenov Ufa State Aviataitoin Techinical University Russia
    Frequency response effects on electrical field and microdischarge distribution during PEO process
    Nagahiro Saito Nagoya University Japan
    Solution Plasma Surface Modification and Coatings

    Industrial Technology and Applications

    Name Affiliation Nationality Presentaion title
    Ivan Fernandez Nano-Energy Spain
    Latest developments in HIPIMS and commercial processes
    Hideaki Yamada National Institute of Advanced Science and Technology Japan
    Diamond and Plasma Processing for Industrial Applications
    Tsuyoshi Moriya TEL Co Japan
    Applications of informatics to plasma processes
    Dave Doerwald Hauzer Techno Coating B.V Nederland
    Industry 4.0 from the view point of PVD/PECVD coating production: status and outlook